Two-dimensional spatial-phase-locked electron-beam lithography via sparse sampling Article

Hastings, JT, Zhang, F, Finlayson, MA et al. (2000). Two-dimensional spatial-phase-locked electron-beam lithography via sparse sampling . 18(6), 3268-3271. 10.1116/1.1314371

cited authors

  • Hastings, JT; Zhang, F; Finlayson, MA; Goodberlet, JG; Smith, HI

fiu authors

abstract

  • Spatial-phase-locked electron-beam lithography (SPLEBL) developed to improve the pattern-placement accuracy of scanning-electron-beam lithography (SEBL) tools is presented.This mode of SPLEBL provides two dimensional sub-beam-step pattern placement, enen with the extremely poor signal-to-noise ratio (SNR). It is expected that the improvements to scintillator and light collection system will increase SNR and pattern-placement accuracy.

publication date

  • November 1, 2000

Digital Object Identifier (DOI)

start page

  • 3268

end page

  • 3271

volume

  • 18

issue

  • 6