pub125230

cited authors

  • Park, Benjamin Y; Zaouk, Rabih; Wang, Chunlei; Madou, Marc J

keywords

  • ALLOMETRIC SCALING LAWS
  • FILMS
  • MICROELECTROMECHANICAL SYSTEMS
  • Materials Science
  • ORIGIN
  • PHOTORESIST
  • Physical Sciences
  • Science & Technology
  • Technology

WoS ID

  • 000243380200086

start page

  • P1

volume

  • 154