A novel method for the fabrication of high-aspect ratio C-MEMS structures Article

keywords

  • CARBON-FILMS
  • Engineering
  • Engineering, Electrical & Electronic
  • Instruments & Instrumentation
  • LAYERS
  • LITHOGRAPHY
  • Li intercalation
  • MICROSTRUCTURES
  • Nanoscience & Nanotechnology
  • PERFORMANCE
  • PYROLYZED PHOTORESIST
  • Physical Sciences
  • Physics
  • Physics, Applied
  • RADIATION
  • RESIST
  • Science & Technology
  • THICK
  • Technology
  • complex microelectromechanical systems (C-MEMS)
  • high-aspect ratio
  • microbattery
  • photoresist
  • pyrolysis
  • suspended structure

Digital Object Identifier (DOI)

start page

  • 348

end page

  • 358

issue

  • 2