Effect of oxygen component in magneto-active microwave CH4/He plasma on large-area diamond nucleation over Si Conference

Jeon, HM, Wang, CL, Hatta, A et al. (1999). Effect of oxygen component in magneto-active microwave CH4/He plasma on large-area diamond nucleation over Si . 38(7B), 4500-4503. 10.1143/JJAP.38.4500

cited authors

  • Jeon, HM; Wang, CL; Hatta, A; Ito, T

fiu authors

date/time interval

  • October 19, 1998 -

publication date

  • July 1, 1999
  • October 19, 1998

keywords

  • CHEMICAL VAPOR-DEPOSITION
  • Physical Sciences
  • Physics
  • Physics, Applied
  • Science & Technology
  • diamond
  • magneto-active microwave plasma
  • nucleation
  • optical emission
  • oxygen component

Location

  • MAUI, HI

Digital Object Identifier (DOI)

Conference

  • 4th International Conference on Reactive Plasmas (ICRP-4)

start page

  • 4500

end page

  • 4503

volume

  • 38

issue

  • 7B