Effects of alcohol addition on the deposition of diamond thick films by dc plasma chemical vapor deposition method Article

cited authors

  • Bai, YZ; Jiang, ZG; Wang, CL; Jin, ZS; Lü, XY; Zou, GT

fiu authors

abstract

  • Diamond films have been deposited by dc plasma chemical vapor deposition method. The addition of alcohol in the resource gas largely increases the deposition rate. The effects of alcohol addition on deposition rate and film quality are analyzed by scanning electron microscopy and Raman spectrometry. The mechanism of experimental phenomena is discussed. ©by Allerton Press, Inc.

publication date

  • December 1, 1998

Digital Object Identifier (DOI)

start page

  • 228

end page

  • 229

volume

  • 15

issue

  • 3