Herein, we report a C-NEMS (Carbon Nano Electrical Mechanical Systems) technique for the synthesis carbon structures by pyrolysis of thin film SU-8 photoresist patterned by electron beam lithography (EBL). We have demonstrated the technique to fabricate carbon nano wires of controllable dimension and location using a top-down methodology. The width and thickness of the wires are in the tens of nanometer range. Additionally, the technique is able to produce conducting aligned carbon nano wires with addressable positioning, controllable length, and high aspect ratio (length vs width). These carbon nano wires can be exploited in large-scale assembly to make highly integrated nano wire sensor arrays or electronic devices.