Pore structural analysis on poly(methyl) silsesquioxane porous thin films by synchrotron radiation small angle X-ray scattering Article

Gao, F, Li, S, Chen, H et al. (2012). Pore structural analysis on poly(methyl) silsesquioxane porous thin films by synchrotron radiation small angle X-ray scattering . 26(1), 68-72.



cited authors

  • Gao, F; Li, S; Chen, H; Wu, Z; Li, Z

fiu authors

abstract

  • A group of poly(methyl) silsesquioxane nanoporous thin films were prepared by pore-generating and spin-coating processes. The nanoporous thin films were characterized using Fourier transform infrared spectroscopy (FT-IR) and thermogravimetric analyzer (TGA). And their scattering profiles and scattering intensities of the group of samples with different porosity were obtained by small angle X-ray scattering (SAXS) in grazing incidence (GISAXS) mode. The results show that there is a good compatibility between the poly(methyl) silsesquioxane precursor and porogen. The films exhibit pore fractal characteristics with disagreement with Porod's law and give out positive deviation, and the micro-density fluctuations between film substrate and pore structure existed in the system, having a maximum 3 nm of pore radius for the group of poly(methyl) silsesquioxane nanoporous thin films. © Right.

publication date

  • February 1, 2012

start page

  • 68

end page

  • 72

volume

  • 26

issue

  • 1