Thickness analysis for thin-film by glazing exit X-ray fluorescence with synchrotron radiation source Article

Gong, Y, Chen, B, Ni, QL et al. (2005). Thickness analysis for thin-film by glazing exit X-ray fluorescence with synchrotron radiation source . 29(11), 1104-1106.



cited authors

  • Gong, Y; Chen, B; Ni, QL; Cui, MQ; Zhao, YD; Wu, ZH

fiu authors

abstract

  • The grazing exit X-ray fluorescence provides a possibility to analyze the characteristics of thin film and multilayer, especially the thickness, interface structure and composition. The Cr film samples with different thickness deposited on silicon (Si) bases are tested with grazing method using Beijing synchrotron radiation source (SR) as excitation light. The results agree with the theoretical prediction, and the interference of emitted X-ray has been observed.

publication date

  • November 1, 2005

start page

  • 1104

end page

  • 1106

volume

  • 29

issue

  • 11